Author Topic: Underbasing the opacity mask distress pattern inside AI  (Read 3600 times)

Offline Dottonedan

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Re: Underbasing the opacity mask distress pattern inside AI
« Reply #15 on: May 24, 2017, 04:35:18 PM »
A job like this is where documentation benefits greatly.
Once you landed on where you wanted it to look the first time, you should have documentation on every step for press.


Ink type, ink modification, pressure, speed, angle, duro, off contact, mesh, lpi, print sequence etc.
All those are key components to setting it up faster and consistent prints.


Do this and it will be very close if not exact the next time.
Artist & high end separator, Owner of The Vinyl Hub, Owner of Dot-Tone-Designs, Past M&R Digital tech installer for I-Image machines. Over 35 yrs in the apparel industry. e-mail art@designsbydottone.com